CVP21 with footprint 60(W)*80(D)*195(H)cm,
to minimize space requirements in clean room.

CVP21 is the COMPLETE SOLUTION:

CVP21 supports the COMPLETE spectrum of materials:

• Group IV semiconductors as Silicon (Si), Germanium (Ge), Silicon Carbide (SiC), or

• III-V semiconductors as Gallium Arsenide (GaAs), Indium Phosphide (InP), Gallium Phosphide (GaP), ..., or

• ternary III-V alloys as Aluminum Gallium Arsenide (AlGaAs), Gallium Indium Phosphide (GaInP), Aluminium Indium Arsenide (AlInAs) ..., or

• quaternary III-V alloys as Aluminum Gallium Indium Phosphide (AlGaInP), ..., or

• Nitrides, as Gallium Nitride (GaN), Aluminum Gallium Nitride (AlGaN), Indium Gallium Nitride (InGaN) or Aluminum Indium Nitride (AlInN), or

• II-VI semiconductors as Zinc Oxide (ZnO), Cadmium Telluride (CdTe), Mercury Cadmium Telluride (HgCdTe, MCT)..., or

• less commonly used semiconductors (please contact us for sample measurements).

CVP21 supports the COMPLETE sample range:

• Stacked layers are no problem (the material, the doping and the doping type may vary).

• No Restrictions concerning the substrate (may be conductive or insulating).

• Sample size: 4*2 mm² to complete 8" wafer size are standard (smaller samples on request).

CVP21 supports the COMPLETE resolution range:

• Concentration resolution < 10¹² cm^-3 to > 10²¹ cm^-3 (*).

• Depth resolution 1 nm to 100 µm (*).

(*) may depend on material type/ sample quality. Please ask for sample measurements

CVP21 comes as a  COMPLETE measurement system:

• High Reliability system (special concern on electronics, mechanics, optics and fluid system).

• Calibration-free system (Complete self calibrating electronic system - no needs for cable capacitance calibration).

• Easy-to-use (Software optimized with full user management - easily used as well in production as in laboratory environment).

• Wafer-Stepping (Complete wafer stepper is optionally available - to process several measurements on a wafer in full automation).

• Camera-Control (The process is controlled on-line by a color camera - after each measurement camera data is available in film strip format).

• Recipes (Measurement recipes are pre-defined and may easily modified by a user with higher priority).

• Dry-In / Dry-Out: Auto-Load / Unload / Reload (The loading/ un-loading and re-loading of the electrochemical cell is automated and may be easily modified by a user with higher priority. The samples are processed dry-in / dry-out).

CVP21 as a table-top unit
(not shown: PC with monitor and printer, and drain can for used electrolyte).

CVP21 can be delivered:

• either as a table-top unit (width 60 cm, depth 80 cm, additional space for PC, monitor, keyboard, printer, and drain can required),

• or with a footprint of 60*80 cm to minimize space requirements in clean room.

CVP21 installation requirements:

• Nitrogen or dry air with adjustable pressure 2..5 bar, tube with ID4/OD6mm (to automatically dry the sample after the measurement),

• Exhaust, tube with ID 3/4" (to allow operation with bad smelling electrolytes, e. g. ammonium based electrolytes),

• Vacuum of typically 0.2 bar, tube with ID4/OD6mm (to hold larger samples on the wafer hood), and

• 230V(-15%/+10%), 50-60Hz, 500VA-1000VA (voltage 100V/110V optionally available).